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Wednesday, October 09, 2002

"NANOREPAIR: IBM to liscene 100-femtosecond mask repair tool"
High-speed physics researcher Richard Haight of IBM Corp.'s T.J. Watson Research Center announces that IBM is releasing its sub-100-nanometer lithographic mask repair technology for general license.

Audio interviews: http://ampcast.com/RColinJohnson

Interview CDs: http://mp3.com/RColinJohnson

Story in EE Times: http://www.eet.com/at/news/OEG20021008S0036