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Monday, January 06, 2003

"EXTREME-UV: Researchers improve tabletop EUV laser"
Professors Margaret Murnane and Henry Kapteyn at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet (EUV) laser system built with off-the-shelf components without altering its $5,000 cost, opening the system to a new range of possible applications, including nanoscale chip lithography and microscopy. By modifying their previous tabletop EUV system, the researchers increased the system's output power from 100 watts to 1 megawatt, and downsized the wavelength of its laser beam from 30 nanometers to 7 nm, making it applicable to 13 nm lithography and microscopy.
Text: http://www.eet.com/at/news/OEG20030103S0061